Sequential and non-sequential ray tracing and polarization-based ray doubling at material interfaces and in anisotropic media.

Uses the polarization ray trace (PRT) matrix tracks polarization effects at every surface, incorporating 100 built-in functions for easy polarization calculations, including Fresnel polarization coefficients.

Use our extensive thin film library on top of easy-to-use tools for designing and simulating custom thin film coatings.

Advanced simulation tools for modeling how light interacts with gratings and other periodic optical structures, leveraging Rigorous Coupled-Wave Analysis (RCWA) to accurately compute diffraction, polarization changes, and wavefront transformations.

Model and analyze uniaxial, biaxial, and optically active crystal optical elements, accounting for ray splitting and precise polarization effects that result form anisotropic material structures.

Model stress via closed-form analytic expressions or data imported from MoldFlow and Timon3D CAD programs. With these models in hand, track the effects of stress-induced birefringence on wavefront aberrations, interferogram results, point spread functions, and other critical performance metrics.

Integrate polarimetry data easily into optical systems for analysis.

Analyze the polarization state, at each surface interaction, as rays propagate through your optical system. For example, construct Jones and Mueller pupil functions to quantify polarization effects across a system's exit pupil, revealing potential distortions in beam shape, reduced contrast, or unwanted phase shifts.